Browsing Research Papers by Author "Hlatshwayo, T. T"

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CVD growth of ZrC layers at different temperatures.

Alawad, BAB; Biira, Saphina; Bissett, H; Nel, J. T; Hlatshwayo, T. T; Crouse, P. L; Malherbe, J. B (Busitema University ; SciEP, 2016)

Zirconium carbide (ZrC) layers were grown on a graphite substrate by chemical vapour deposition (CVD) at 1250°C, 1300°C and 1350°C. Zirconium tetrachloride (ZrCl4), methane (CH4), hydrogen (H2) and argon (Ar) were used as ...
Effect of temperature and CH4/ZrCl4 molar ratio on ZrC layers deposited in a vertical-wall CVD system

Biira, Saphina; Alawad; Bissett, H; Nel, J. T; Hlatshwayo, T. T; Crouse, P. L; Malherbe, J. B (Busitema University ; SA Institute of Physics, 2016)

The synthesis of ZrC layers was performed in an in-house developed, vertical-wall chemical vapour deposition (CVD) system operating at atmospheric pressure. Zirconium tetrachloride and methane were used as zirconium and ...
Optimisation of the synthesis of ZrC coatings in a radio frequency induction-heating chemical vapour deposition system using response surface methodology.

Biira, Saphina; Crouse, PL; Bissett, H; Alawad, BAB; Hlatshwayo, T. T; Nel, J. T; Malherbe, J. B (Busitema University ; Elsevier, 2017-01-11)

A chemical vapour deposition process using radio frequency induction heating operating at atmospheric pressure was developed for the deposition of ZrC coatings. The precursors utilised in this process were zirconium ...

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